Diamond film deposition by chemical vapor transport (*.PDF)

Uma rápida revisão das tecnicas usadas para a fabricação de diamante. Menciona-se os parâmetros a considerar-se no depósito de diamante por HFCVD e tentativas para explicar o que acontece durante esse processo.

Fonte:

Chemical vapor deposition techniques for depositing diamond films at low pressure are reviewed, along with current and potential applications for these films. A new chemical vapor transport technique is described that is simpler and suitable for microgravity and centrifuge experiments. It was used to deposit diamond on silicon, molybdenum, graphite, glass, and carbon felt. Selective patterned deposition was achieved on a copper pattern on oxidized silicon. Centrifugation at only about 29 g greatly increased the nucleation density, area of deposition, and growth rate. The self-regulating behavior of this new technique is explained in terms of chemical and transport mechanisms.

Diamond film deposition by chemical vapor transport
Regel, Liya L; Wolcox, William R
Acta Astronautica. Vol. 48, no. 2-3, pp. 129-144. Jan.-Feb. 2001